Reproducible growth of metalorganic chemical vapor deposition derived YBa2Cu3Ox thin films using ultrasonic gas concentration analyzer

Shuu'ichirou Yamamoto, Kouji Nagata, Satoshi Sugai, Akio Sengoku, Yasunari Matsukawa, Takeo Hattori, Shunri Oda

研究成果: Article査読

11 被引用数 (Scopus)

抄録

We report, in detail, on precursor concentration monitoring in the metalorganic chemical vapor deposition (MOCVD) of YBa2Cu3Ox (YBCO) by ultrasonic measurement and a newly developed feedback system to solve reproducibility problems. The fluctuation of the flow rate of dipivaloylmethanate (DPM) compounds has been clearly observed. We have proposed a feedback system using an ultrasonic concentration analyzer and two sets of mass flow controllers for each precursor, and have proven the validity of the operation.

本文言語English
ページ(範囲)4727-4732
ページ数6
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
38
8 B
DOI
出版ステータスPublished - 1999 8月 15
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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