Reproducible growth of metalorganic chemical vapor deposition derived YBa2Cu3Ox thin films using ultrasonic gas concentration analyzer

Shuu'ichirou Yamamoto; Kouji Nagata; Satoshi Sugai; Akio Sengoku; Yasunari Matsukawa; Takeo Hattori; Shunri Oda

doi:10.1143/jjap.38.4727

Reproducible growth of metalorganic chemical vapor deposition derived YBa₂Cu₃O_x thin films using ultrasonic gas concentration analyzer

Shuu'ichirou Yamamoto, Kouji Nagata, Satoshi Sugai, Akio Sengoku, Yasunari Matsukawa, Takeo Hattori, Shunri Oda

研究成果: Article › 査読

11 被引用数 (Scopus)

抄録

We report, in detail, on precursor concentration monitoring in the metalorganic chemical vapor deposition (MOCVD) of YBa₂Cu₃O_x (YBCO) by ultrasonic measurement and a newly developed feedback system to solve reproducibility problems. The fluctuation of the flow rate of dipivaloylmethanate (DPM) compounds has been clearly observed. We have proposed a feedback system using an ultrasonic concentration analyzer and two sets of mass flow controllers for each precursor, and have proven the validity of the operation.

本文言語	English
ページ（範囲）	4727-4732
ページ数	6
ジャーナル	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
巻	38
号	8 B
DOI	https://doi.org/10.1143/jjap.38.4727
出版ステータス	Published - 1999 8月 15
外部発表	はい

ASJC Scopus subject areas

工学（全般）
物理学および天文学（全般）

文献へのアクセス

10.1143/jjap.38.4727

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引用スタイル

Yamamoto, S., Nagata, K., Sugai, S., Sengoku, A., Matsukawa, Y., Hattori, T., & Oda, S. (1999). Reproducible growth of metalorganic chemical vapor deposition derived YBa₂Cu₃O_x thin films using ultrasonic gas concentration analyzer. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 38(8 B), 4727-4732. https://doi.org/10.1143/jjap.38.4727

Reproducible growth of metalorganic chemical vapor deposition derived YBa₂Cu₃O_x thin films using ultrasonic gas concentration analyzer. / Yamamoto, Shuu'ichirou; Nagata, Kouji; Sugai, Satoshi その他.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 38, No. 8 B, 15.08.1999, p. 4727-4732.

研究成果: Article › 査読

Yamamoto, S, Nagata, K, Sugai, S, Sengoku, A, Matsukawa, Y, Hattori, T & Oda, S 1999, 'Reproducible growth of metalorganic chemical vapor deposition derived YBa₂Cu₃O_x thin films using ultrasonic gas concentration analyzer', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 38, no. 8 B, pp. 4727-4732. https://doi.org/10.1143/jjap.38.4727

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