Recent development of demolding technology in nanoimprint lithography

    研究成果: Article査読

    抄録

    Current status of advanced ultraviolet nanoimprint lithography (UV-NIL) of Jet-and-Flash Imprint lithography (J-FIL) and UV-NIL using condensable gas is introduced. Demolding technologies of releasing cured resins from mold cavities by using release layers for mold surfaces and surfactant additives to UV-curable resins are summarized. Recent studies by mechanical measurements, surface analyses, and morphological inspections in terms of realizing mass production of nanoimprint lithography devices are described.

    本文言語English
    ページ(範囲)706-709
    ページ数4
    ジャーナルKobunshi
    61
    9
    出版ステータスPublished - 2012 9 1

    ASJC Scopus subject areas

    • 化学工学(全般)

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