Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering

Takahira Miyagi, Masayuki Kamei, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, Tetsuya Sato

研究成果: Conference article査読

30 被引用数 (Scopus)

抄録

Pulse mode effects on the crystallization temperature and photocatalytic properties of TiO2 films were investigated. TiO2 films were deposited on silica glass substrates using a pulse magnetron sputtering apparatus in the unipolar and the bipolar pulse modes. X-Ray diffraction showed that in the bipolar pulse mode the rutile phase TiO2 film grew at lower substrate temperature compared with the unipolar pulse mode. The photocatalytic activities obtained from the photoreduction of Ag ions at the surface of TiO2 films indicated that the anatase phase TiO 2 films grown in the bipolar pulse mode had higher photocatalytic activity compared with those grown in the unipolar pulse mode. This suggests that the bipolar pulse mode is an effective technique to achieve higher photocatalytic activity of TiO2 film.

本文言語English
ページ(範囲)32-35
ページ数4
ジャーナルThin Solid Films
442
1-2
DOI
出版ステータスPublished - 2003 10 1
外部発表はい
イベントSelected Papers from the 4th International COnference on Coating - Braunschweig, Germany
継続期間: 2002 11 32002 11 7

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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