Pseudo-interface formation and diffusion behaviour in the B2 phase region of NiAl-base diffusion couples

R. Kainuma, H. Ikenoya, I. Ohnuma, K. Ishida

研究成果: Article査読

6 被引用数 (Scopus)

抄録

The microstructure and concentration profiles in the B2 phase region of the diffusion couples of Ni-Al-X (X: Ti, V, Cr, Mn, Fe, Co and Cu) ternary systems were examined by EPMA. A pseudo-interface between β1, (low Al) / β2 (high Al) characterized by a sharp change in the concentration profiles of both Al and the alloying element is observed in composition range near 50at%Al. The characteristic features of the concentration profiles in the Ni-Al base ternary diffusion couples are presented and the up-hill diffusion of alloying elements observed at the pseudo-interface of the Ni-Al-X (X: Ti, V, Cr, Mn, Fe, Co and Cu) ternary systems is discussed from a thermodynamic point of view.

本文言語English
ページ(範囲)425-430
ページ数6
ジャーナルDefect and Diffusion Forum
143-147
DOI
出版ステータスPublished - 1997

ASJC Scopus subject areas

  • 放射線
  • 材料科学(全般)
  • 凝縮系物理学

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