Pseudo-binary oxide semiconductor alloy films of (1-x)ZnO-x(AgGaO 2)1/2 were fabricated using a conventional rf-magnetron sputtering. The wurtzite-type single phases were obtained in the wide composition range of x ≤ 0.33 because the terminal β-AgGaO2 that corresponds to the composition with x = 1 possesses a wurtzite-derived β-NaFeO2 structure. The energy band gap of ZnO decreased with increasing AgGaO2 concentration, falling to 2.55 eV at x = 0.33. This alloy system enables to use ZnO-based semiconductors in optoelectronic devices working in visible region.
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)