Properties of high quality ZnO films deposited by an RF magnetron mode electron cyclotron resonance (ECR) sputtering system

Michio Kadota, Makoto Minakata

研究成果: Conference article査読

10 被引用数 (Scopus)

抄録

The properties of ZnO film deposited by an RF-magnetron-mode ECR sputtering system, which has added magnets to the outside of a cylindrical zinc metal (Zn) target of the RF-mode ECR sputtering system reported previously, are investigated. The ZnO film on the glass substrate deposited by this system was capable of driving a 1.3 GHz fundamental Rayleigh SAW for the first time. These films exhibit almost the same effective electromechanical coupling factors (keff) as the theoretical keff values calculated by finite element method (FEM) using the constants of ZnO single crystal and lower insertion loss in comparison with the films deposited by the DC-mode ECR and the RF-mode ECR. The ZnO film on R-plane sapphire deposited by this system shows a (112̄0) plane epitaxial ZnO film, which is capable of driving a 2.54 GHz Sezawa wave. By measuring a photoluminescence of a thin epitaxial ZnO film with thickness of 1.2 μm, free excitons are observed for the first time.

本文言語English
ページ(範囲)303-308
ページ数6
ジャーナルProceedings of the IEEE Ultrasonics Symposium
1
出版ステータスPublished - 1996 12 1
イベントProceedings of the 1996 IEEE Ultrasonics Symposium. Part 2 (of 2) - San Antonio, TX, USA
継続期間: 1996 11 31996 11 6

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

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