Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

G. Sato, T. Kato, W. Oohara, R. Hatakeyama

研究成果: Article査読

8 被引用数 (Scopus)

抄録

In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1-10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa.

本文言語English
ページ(範囲)550-554
ページ数5
ジャーナルThin Solid Films
506-507
DOI
出版ステータスPublished - 2006 5 26

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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