Process of crystallization in thin amorphous tin oxide film

T. Kobayashi, Y. Kimura, H. Suzuki, T. Sato, T. Tanigaki, Y. Saito, C. Kaito

研究成果: Article査読

20 被引用数 (Scopus)

抄録

Amorphous tin oxide films deposited on carbon substrates have been studied by high-resolution transmission electron microscopy. As-deposited film was composed of a mixture of microcrystallites of SnO, SnO2 and SnO3 with size of 2 nm. Crystallization took place above 450°C. SnO crystals appeared between 450°C and 500°C, whereas SnO2 crystals appeared above 550°C. The appearance of β-tin crystals with the reduction of tin oxide has been verified using the heating stage of the electron microscope. A drop of liquid tin was recognized upon heating above 500°C. The difference in crystallization upon applying an electron beam, synchrotron radiation and heating in vacuum has been summarized and discussed with respect to the problem of the excitation of crystallites.

本文言語English
ページ(範囲)143-150
ページ数8
ジャーナルJournal of Crystal Growth
243
1
DOI
出版ステータスPublished - 2002 8 3

ASJC Scopus subject areas

  • 凝縮系物理学
  • 無機化学
  • 材料化学

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