Print and imprint method for nanoimprint lithography with high-viscosity photo-curable resins

Takahiro Nakamura, Masaru Nakagawa

    研究成果: Conference contribution

    1 被引用数 (Scopus)

    抄録

    Ultraviolet nanoimprint lithography (UV-NIL) has become one of advanced pattering methods for fabrication of micro-and nano-structures over several inches by replication with designed mold patterns at high throughput and low cost. For practical application of UV-NIL, it is essential to eliminate bubble defects and to make residual layer thicknesses (RLTs) of a fabricated resist pattern uniform after the imprint process for subsequent dry-etching processes. We demonstrated the high-viscosity UV-curable resin (viscosity=12,800 mPas) suitable for bubble-defect-free UV nanoimprinting in a condensable gas atmosphere. We enabled to deposit droplets of the high-viscosity resin on a substrate by screen printing with a through-hole membrane with the volume of sub-pico liter. The method was effective for leveling RLTs in bubble-defect-free UV-NIL. In the present study, we give an overview of 'Print and Imprint' method comprising screen printing and UV-NIL, and demonstrate the position-selective placement of high-viscosity resin droplets by screen printing.

    本文言語English
    ホスト出版物のタイトル2017 International Conference on Electronics Packaging, ICEP 2017
    出版社Institute of Electrical and Electronics Engineers Inc.
    ページ443-446
    ページ数4
    ISBN(電子版)9784990218836
    DOI
    出版ステータスPublished - 2017 6 5
    イベント2017 International Conference on Electronics Packaging, ICEP 2017 - Tendo, Yamagata, Japan
    継続期間: 2017 4 192017 4 22

    出版物シリーズ

    名前2017 International Conference on Electronics Packaging, ICEP 2017

    Other

    Other2017 International Conference on Electronics Packaging, ICEP 2017
    国/地域Japan
    CityTendo, Yamagata
    Period17/4/1917/4/22

    ASJC Scopus subject areas

    • 電子工学および電気工学
    • 産業および生産工学
    • 電子材料、光学材料、および磁性材料

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