Preparation of structure-graded yttria film by laser CVD

Teiichi Kimura, Ryan Banal, Takashi Goto

研究成果: Article査読

抄録

Yttria films were prepared by laser CVD using an Y(dpm) 3 precursor. When the laser power (P L) was less than 100 W, deposition rates were small around 10 μm/h comparable to those by conventional thermal CVD. At P L> 160 W, deposition rates increased drastically to more than 200 μm/h. The highest deposition rate in this study was 270 μm/h, which is 100 times higher than that reported in literatures. Film morphologies changed from a dense isotropic structure to a (440) oriented columnar structure with increasing substrate pre-heating temperature. By changing PL during deposition, a structure-graded yttria film was obtained. Moreover, Periodically structure-graded yttria films were also prepared by periodical changing of P L.

寄稿の翻訳タイトルPreparation of structure-graded yttria film by laser CVD
本文言語Japanese
ページ(範囲)845-850
ページ数6
ジャーナルFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
52
11
DOI
出版ステータスPublished - 2005 11月

Keywords

  • Deposition rate
  • Laser chemical vapor deposition
  • Morphology
  • Structure-graded material
  • Yttria film

ASJC Scopus subject areas

  • 機械工学
  • 産業および生産工学
  • 金属および合金
  • 材料化学

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