Preparation of Na-β-alumina films by laser chemical vapor deposition

Chen Chi, Hirokazu Katsui, Takashi Goto

研究成果: Article査読

11 被引用数 (Scopus)

抄録

This study demonstrates the growth of Na-β-alumina films by laser chemical vapor deposition and investigates the effects of deposition temperature (Tdep), molar ratio of Na/Al (RNa/Al) and total pressure (Ptot) on the phase formation, microstructure, orientations and deposition rate (Rdep) of the film. Single-phase Na-β-alumina films were deposited at (Tdep)=1310K-1360K, RNa/Al>20 and Ptot>600Pa. Na-β-alumina films with the hexagonally faceted platelet morphology were deposited at Ptot=1000Pa, whereas flake-like grains were formed at Ptot=600Pa. Na-β-alumina was co-deposited with α-Al2O3 at Ptot<600Pa and Tdep>1350K, in which the film morphology showed flake-like grains with smaller granules. The maximum Rdep of Na-β-alumina films was 44μmh-1.

本文言語English
ページ(範囲)534-538
ページ数5
ジャーナルSurface and Coatings Technology
276
DOI
出版ステータスPublished - 2015 8月 25

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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