Preparation of hydrogen peroxide sensitive nanofilms by a layer-by-layer technique

Kentaro Yoshida, Tetsuya Ono, Takenori Dairaku, Yoshitomo Kashiwagi, Katsuhiko Sato

研究成果: Article査読

2 被引用数 (Scopus)

抄録

H2O2-sensitive nanofilms composed of DNA and hemin-appended poly(ethyleneimine) (H-PEI) were prepared by a layer-by-layer deposition of DNA and H-PEI through an electrostatic interaction. The (H-PEI/DNA)5 film was decomposed by addition of 10 mM H2O2. H2O2-induced decomposition was also confirmed in the hemin-containing (PEI/DNA)5 in which hemin molecules were adsorbed by a noncovalent bond to the nanofilm. On the other hand, the (PEI/DNA)5 film containing no hemin and the (H-PEI/PSS)5 film using PSS instead of DNA did not decompose even with 100 mM H2O2. The mechanism of nanofilm decomposition was thought that more reactive oxygen species (ROS) was formed by reaction of hemin and H2O2 and then the ROS caused DNA cleavage. As a result (H-PEI/DNA)5 and hemin-containing (PEI/DNA)5 films were decomposed. The decomposition rate of these nanofilms were depended on concentration of H2O2, modification ratio of hemin, pH, and ionic strength.

本文言語English
論文番号941
ジャーナルNanomaterials
8
11
DOI
出版ステータスPublished - 2018 11月 15

ASJC Scopus subject areas

  • 化学工学(全般)
  • 材料科学(全般)

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