Preparation of high purity metals for advanced devices

Minoru Isshiki, Kouji Mimura, Masahito Uchikoshi

研究成果: Article査読

12 被引用数 (Scopus)

抄録

The purity is one of the essential factors of the materials for preparing well controlled materials and devices, because the existence of ppm or sub-ppm level impurities leads to a significant and sometimes critical influence on the material properties and devise performance. Since the development of high technology depends strongly on the availability of high purity metals required for fabricating a new functional device, and furthermore, the purity of commercial pure materials for exploratory material researches is insufficient, the purification process that meets any requirements should be developed. In this article, based on our experience, we will describe how to construct the purification process, purification methods, and the purification of iron as an example.

本文言語English
ページ(範囲)8451-8455
ページ数5
ジャーナルThin Solid Films
519
24
DOI
出版ステータスPublished - 2011 10月 3

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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