Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties

R. Morohashi, N. Wakiya, T. Kiguchi, T. Yoshioka, J. Tanaka, K. Shinozaki

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Lithium niobate (LiNbO3) thin films were deposited on Al 2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at λ = 632.8 nm, which is close to that of bulk crystal.

本文言語English
ページ(範囲)179-182
ページ数4
ジャーナルKey Engineering Materials
388
出版ステータスPublished - 2009 1 1
外部発表はい

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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