Preparation of calcium phosphate films by radiofrequency magnetron sputtering

Takayuki Narushima, Kyosuke Ueda, Takashi Goto, Hiroshi Masumoto, Tomoyuki Katsube, Hiroshi Kawamura, Chiaki Ouchi, Yasutaka Iguchi

研究成果: Article査読

56 被引用数 (Scopus)

抄録

Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca 10(PO 4) 6O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO 2) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing Co 2. The highest deposition rate was 0.143 nm·s -1 (0.515 μm -1).

本文言語English
ページ(範囲)2246-2252
ページ数7
ジャーナルMaterials Transactions
46
10
DOI
出版ステータスPublished - 2005 10

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

フィンガープリント 「Preparation of calcium phosphate films by radiofrequency magnetron sputtering」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル