Atomically smooth rutile TiO2(110), (100), (001), (111) and (101) surfaces were obtained for the first time by an appropriate cleaning and subsequent thermal treatment of commercially available single crystals. The annealing temperature for obtaining the ultra-smooth surface varied between 400 and 900°C depending on the crystallographic planes. The key point to the successful preparation of the regularly stepped TiO2 surface was an HF treatment for the removal of surface impurities. By using these well-defined TiO2 surfaces, the photochemical property was found to depend on the surface orientation; the photo-reduction of Ag+ to Ag metal from an aqueous solution proceeded in the order of (101) > (100) > (001) > (111) > (110) on the TiO2 surfaces.
|ジャーナル||Japanese Journal of Applied Physics, Part 2: Letters|
|出版ステータス||Published - 2005 12月 1|
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