Prediction of abnormal etching profile in high-aspect-ratio via/hole etching using on-wafer monitoring system

Hiroto Ohtake, Seiichi Fukuda, Butsurin Jinnai, Tomohiko Tatsumi, Seiji Samukawa

研究成果: Article査読

5 被引用数 (Scopus)

抄録

For the prediction of abnormal etching profiles, an ion trajectory prediction system has recently been developed. In this system, sheath modeling was combined with the on-wafer monitoring technique for accurate prediction. This system revealed that sidewall conductivity strongly affects the charge accumulation and ion trajectory in high-aspect-ratio holes. It was also found that the accumulated charge in adjacent holes is one of the reasons for the generation of twisting profiles according to analysis using the system. We presume that the prediction system is an effective tool for developing nanoscale fabrication.

本文言語English
論文番号04DB14
ジャーナルJapanese journal of applied physics
49
4 PART 2
DOI
出版ステータスPublished - 2010 4

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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