PRACTICAL PHOTOMASK PINHOLE DEFECT REPAIR USING MICROMETER SCALE PATTERN CD CVD WITH KHZ REPETITION UV LIGHT PULSES.

Y. Morishige; H. Yokoyama; S. Kishida; K. Washio; H. Kinoshita; S. Nakamura; R. Tatsumi

PRACTICAL PHOTOMASK PINHOLE DEFECT REPAIR USING MICROMETER SCALE PATTERN CD CVD WITH KHZ REPETITION UV LIGHT PULSES.

Y. Morishige, H. Yokoyama, S. Kishida, K. Washio, H. Kinoshita, S. Nakamura, R. Tatsumi

研究成果: Paper › 査読

抄録

Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.

本文言語	English
ページ	286-287
ページ数	2
出版ステータス	Published - 1985 12 1
外部発表	はい

ASJC Scopus subject areas

Engineering(all)

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引用スタイル

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abstract = "Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.",

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AU - Morishige, Y.

AU - Yokoyama, H.

AU - Kishida, S.

AU - Washio, K.

AU - Kinoshita, H.

AU - Nakamura, S.

AU - Tatsumi, R.

PY - 1985/12/1

Y1 - 1985/12/1

N2 - Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.

AB - Summary form only given. A practical photomask pinhole defect repairing technique has been established for the first time by laser-induced chromium (Cr) chemical vapor deposition (CVD). The authors have adopted kilohertz repetition of ultraviolet (UV) light pulses produced by fourth harmonic generation of continuously pumped Q-switched Nd:YAG laser radiation as the CVD light source. The deposited film durability against washing and acid preparation was as high as that of the primary Cr film on the mask. The deposited film did not peel off even when scratched by stainless steel tweezers.

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