抄録
Sulfonated cyclodextrins (s-α-CyD and s-β-CyD) were employed for constructing photosensitive thin films containing azobenzene residues. Azobenzene-modified poly(allylamine hydrochloride) (Az-PAH) and s-α-CyD or s-β-CyD were deposited alternately on the surface of a quartz slide to prepare multilayer thin films. Az-PAH formed inclusion complex in the Az-PAH/s-α-CyD film but not in the Az-PAH/s-β-CyD film. The Az-PAH isomerized from E - to Z -isomer in the films under UV light irradiation, and the original E -form was recovered under visible light irradiation or thermally in dark. The thermal isomerization followed the first-order kinetics in the swelled films though the kinetics deviated from the first-order plot in the dry films. The host-guest complexation of Az-PAH and s-α-CyD in the film affected significantly on the photochemical and thermal isomerization.
本文言語 | English |
---|---|
ページ(範囲) | 579-583 |
ページ数 | 5 |
ジャーナル | Materials Science and Engineering C |
巻 | 23 |
号 | 5 |
DOI | |
出版ステータス | Published - 2003 10月 15 |
ASJC Scopus subject areas
- 材料科学(全般)
- 凝縮系物理学
- 材料力学
- 機械工学