Plasma sputtering and optical properties of Au/SiO2 nano-composite films

Bo Ping Zhang, Li Shi Jiao, Hiroshi Masumoto, Takashi Goto

研究成果: Conference article査読

抄録

Au/SiO2 nano-composite thin films with 3 to 65 vol% Au content were prepared by induction-coil-coupled plasma sputtering. Au particles dispersed in the SiO2 matrix can be prepared by controlling the deposition time of one Au layer and the thickness of the one SiO2 layer. The Au nano-particle dispersed Au/SiO2 multilayer with an uniform nano-layered microstructure showed the absorption peak at the wavelength of 560 nm. The heat-treated Au/SiO2 films containing 3 to 65 vol% Au showed absorption peaks at the wavelength of 540 to 560 nm, while no absorption peak was observed in the as-deposited multilayers containing more than 12 vol% Au.

本文言語English
ページ(範囲)1571-1574
ページ数4
ジャーナルMaterials Science Forum
475-479
II
DOI
出版ステータスPublished - 2005 1 1
イベントPRICM 5: The Fifth Pacific Rim International Conference on Advanced Materials and Processing - Beijing, China
継続期間: 2004 11 22004 11 5

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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