Plasma fluorination of polyimide thin films

Kazuhiko Endo, Toru Tatsumi

研究成果: Article査読

13 被引用数 (Scopus)

抄録

The surface of polyimide films was fluorinated and a CF3 surface layer formed. The dielectric constant of the polyimide films decreased to a minimum of 2.5 as the treatment time increased. The leakage current of the polyimide films was also decreased significantly by the fluorination. The measurement of electrical properties and secondary ion mass spectroscopy revealed that the fluorine atoms diffused into the polyimide films from the fluorinated surface layer. The current-voltage characteristics indicated that reduction in the leakage current was due to fewer ionic impurities. This confirms that the fluorine diffused into the polyimide and it eliminated impurity ions.

本文言語English
ページ(範囲)3134-3137
ページ数4
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
15
6
DOI
出版ステータスPublished - 1997
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

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