Compared to conventional RF magnetron sputtering systems, electron cyclotron resonance (ECR) sputtering systems are characterized by the ability to generate high-density plasma under low gas pressure. (1120)-plane oriented epitaxial ZnO films were deposited on an R-plane sapphire substrate using the RF-magnetron-mode ECR sputtering equipment. As the results of the measurement, the films showed a good orientation and excellent effective electromechanical coupling factors (Keff) for the Rayleigh surface acoustic wave (SAW) and its high-order SAW waves. These coupling factors were equal to or higher than the theoretical values keff obtained by the finite element method (FEM) analysis using a single crystal material constant.
|ジャーナル||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|号||5 SUPPL. B|
|出版ステータス||Published - 1998 5|
ASJC Scopus subject areas
- Physics and Astronomy(all)