Photosensitive polyetherimide (Ultem) based on reaction development patterning (RDP)

Takafumi Fukushima, Yukiko Kawakami, Toshiyuki Oyama, Masao Tomoi

研究成果: Article査読

18 被引用数 (Scopus)

抄録

Photosensitive polyetherimide (PEI) consisting of non-photosensitive PEI (Ultem®) and photosensitive diazonaphthoquinone (DNQ) compounds gave positive-tone behavior by UV irradiation, followed by development in solution including ethanolamine. The SEM of the resultant images showed fine patterns with 10-15 μm film thickness. GPC and 1H-NMR measurements that can give information on the structure of dissolved components in the irradiated region were carried out in order to clarify the mechanism of pattern formation. The imaging of photosensitive PEI is based on reaction development patterning (RDP), where the amine causes main-chain scission directly related to the pattern formation in development step to form low molecular weight amidized products.

本文言語English
ページ(範囲)191-196
ページ数6
ジャーナルJournal of Photopolymer Science and Technology
15
2
DOI
出版ステータスPublished - 2002
外部発表はい

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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