Photosensitive polyarylates based on reaction development patterning

Toshiyuki Oyama, Akira Kitamura, Takafumi Fukushima, Takao Iijima, Masao Tomoi

研究成果: Article査読

27 被引用数 (Scopus)

抄録

Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methyl-pyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9-14 μm film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.

本文言語English
ページ(範囲)104-108
ページ数5
ジャーナルMacromolecular Rapid Communications
23
2
DOI
出版ステータスPublished - 2002 1月 31
外部発表はい

ASJC Scopus subject areas

  • 有機化学
  • ポリマーおよびプラスチック
  • 材料化学

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