Photoresist removal-cleaning technology using cryogenic micro-solid nitrogen spray

Jun Ishimoto, U. Oh, Tomoki Koike, Naoya Ochiai

研究成果: Article査読

8 被引用数 (Scopus)

抄録

The fundamental characteristics of a thermomechanical resist removal-cleaning system using cryogenic micro-nano solid nitrogen spray flow was investigated using a new type of integrated measurement coupled numerical technique. The effect of ultra-high heat flux cooling on the resist removal performance due to the thermal contraction of resist material was clarified. It was numerically predicted that resist removal performance could be improved by the scraping effect of impinging micro-solid nitrogen particle with plastic deformation in the narrow region between the resist. Furthermore, it was numerically and xperimentally found that the hybrid interactive effects of fluid mechanical force by impingement of micro-solid particles and the thermomechanical effect due to ultra-high heat transfer characteristics contribute to the resist removal-cleaning process.

本文言語English
ページ(範囲)N3046-N3053
ジャーナルECS Journal of Solid State Science and Technology
3
1
DOI
出版ステータスPublished - 2014

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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