Photon-stimulated desorption from chemically treated Si surfaces

Isao Ochiai, Taro Ogawa, Yuji Takakuwa, Kozo Mochiji

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Experimental results are presented on the synchrotron-radiation-induced desorption of oxygen ions from HF-treated Si surfaces measured with a quadrupole mass analyzer operated in the pulse-counting mode. The effect of atomic hydrogen exposure was studied. Desorption of H+, O+ and F+ ions was observed from HF-treated Si surfaces. The yield of O+ ions was increased more than 30-fold by exposure to atomic hydrogen.

本文言語English
ページ(範囲)175-177
ページ数3
ジャーナルSurface Science
287-288
PART 1
DOI
出版ステータスPublished - 1993 5月 10

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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