Photoemission study on interfacial reaction of Ti/n-type GaN

T. Naono, J. Okabayashi, S. Toyoda, H. Fujioka, M. Oshima, H. Hamamatsu

研究成果: Conference article査読

6 被引用数 (Scopus)

抄録

In order to understand the mechanism of ohmic-contact formation by the annealing of Ti electrodes on n-type GaN, we have investigated the changes in the energy-band structure of Ti/n-type GaN depending on annealing temperature using photoemission spectroscopy. Valence-band spectrum for an as-deposited sample was explained by the simple summation of Ti and GaN spectra. Spectral line shapes significantly changed by annealing at 500 and 700°C, suggesting the formation of a TiN layer. The peak shifts of Ga 3d and N 1s core levels are interpreted as the energy-band bending and interfacial reaction with the formation of the TiN layer. It is revealed that the ohmic-contact formation by the annealing is attributed to the formation of GaN with nitrogen vacancies, which is consistent with the current-voltage characteristics.

本文言語English
ページ(範囲)277-280
ページ数4
ジャーナルApplied Surface Science
244
1-4
DOI
出版ステータスPublished - 2005 5 15
外部発表はい
イベント12th International Conference on Solid Films and Surfaces - Hammatsu, Japan
継続期間: 2004 6 212004 6 25

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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