Photochemical behavior and photochemical acid generation of arylmethylsulfonylbenzenes

Yuko Kawashima, Motohiro Tagaya, Masaru Nakagawa, Tomokazu Iyoda

研究成果: Paper査読

抄録

We previously developed a novel photosensitive monolayer bearing a 4-(benzylsulfonyl)phenyl moiety as a photoreactive unit leading to photopattern by photolithography. The photosensitive monolayer transforms a monolayer composed of benzenesulfinic acid moiety by ultraviolet light exposure. The transformation causes the monolayer surface to be hydrophilic. To use widely the photopatterned monolayer, the photosensitivity of the monolayer should be improved. In this study, we synthesized 13 types of arylmethylsulfonylbenzenes as model compounds and investigated their photochemical behaviors in 2-propanol by ultraviolet light exposure. The photogeneration of benzenesulfinic acid from the arylmethylsulfonylbenzenes was compared by UV-visible spectral measurement and titration.

本文言語English
ページ数1
出版ステータスPublished - 2005 12 1
外部発表はい
イベント54th SPSJ Annual Meeting 2005 - Yokohama, Japan
継続期間: 2005 5 252005 5 27

Other

Other54th SPSJ Annual Meeting 2005
国/地域Japan
CityYokohama
Period05/5/2505/5/27

ASJC Scopus subject areas

  • 工学(全般)

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