Perpendicular magnetic anisotropy in epitaxially strained cobalt-ferrite (001) thin films

H. Yanagihara, Y. Utsumi, T. Niizeki, J. Inoue, Eiji Kita

    研究成果: Article査読

    31 被引用数 (Scopus)

    抄録

    We investigated the dependencies of both the magnetization characteristics and the perpendicular magnetic anisotropy of CoxFe3- xO4(001) epitaxial films (x=0.5 and 0.75) on the growth conditions of the reactive magnetron sputtering process. Both saturation magnetization and the magnetic uniaxial anisotropy constant Ku are strongly dependent on the reactive gas (O2) flow rate, although there is little difference in the surface structures for all samples observed by reflection high-energy electron diffraction. In addition, certain dead-layer-like regions were observed in the initial stage of the film growth for all films. Our results suggest that the magnetic properties of Co xFe3-xO4 epitaxial films are governed by the oxidation state and the film structure at the vicinity of the interface.

    本文言語English
    論文番号17A719
    ジャーナルJournal of Applied Physics
    115
    17
    DOI
    出版ステータスPublished - 2014 5月 7

    ASJC Scopus subject areas

    • 物理学および天文学(全般)

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