Patterning high aspect silicon pillars on cantilever by metal assisted chemical etching for humidity sensing

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

Pillars formed by metal assisted chemical etching (MACE) process as a post process on a silicon cantilever are presented in this work. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever have been successfully demonstrated. The high aspect silicon pillar structures from 20 to 40 with smooth surfaces and vertically etched shapes on the cantilever are formed by MACE. In addition, silicon cantilever with high aspect ratio pillars on its surface is proposed for humidity sensing application. The humidity sensing utilize the principle that the pillars stack together based upon the condensation behavior of water vapor on their surfaces.

本文言語English
ホスト出版物のタイトル2017 IEEE 30th International Conference on Micro Electro Mechanical Systems, MEMS 2017
出版社Institute of Electrical and Electronics Engineers Inc.
ページ1232-1235
ページ数4
ISBN(電子版)9781509050789
DOI
出版ステータスPublished - 2017 2 23
イベント30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017 - Las Vegas, United States
継続期間: 2017 1 222017 1 26

出版物シリーズ

名前Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
0
ISSN(印刷版)1084-6999

Other

Other30th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2017
CountryUnited States
CityLas Vegas
Period17/1/2217/1/26

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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