Oxygen-vacancy-induced threshold voltage shifts in Hf-related high-k gate stacks

Kenji Shiraishi, Keisaku Yamada, Kazuyoshi Torii, Yasushi Akasaka, Kiyomi Nakajima, Mitsuru Konno, Toyohiro Chikyow, Hiroshi Kitajima, Tsunetoshi Arikado, Yasuo Nara

研究成果: Article査読

49 被引用数 (Scopus)

抄録

We have investigated theoretically the cause of the substantial threshold voltage (Vth) shifts observed in Hf-related high-k gate stacks with p+poly-Si gates, by focusing on the ionic nature of HfO2. The oxygen vacancy (Vo) level in ionic HfO2 is located in a relatively higher part of the band gap. This high position of the Vo level results in a significant elevation of the Fermi level for p+poly-Si gates, if the p+poly-Si gate is in contact with the high-k HfO2. Vo formation in the HfO2 induces a subsequent electron transfer across the interface, causing a substantial Vth shifts in p+poly-Si gate MISFETs. Moreover, our theory also systematically reproduces other recent experimental results.

本文言語English
ページ(範囲)305-310
ページ数6
ジャーナルThin Solid Films
508
1-2
DOI
出版ステータスPublished - 2006 6 5
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

フィンガープリント 「Oxygen-vacancy-induced threshold voltage shifts in Hf-related high-k gate stacks」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル