Organosoluble silicon and germanium nanoclusters

Akira Watanabe, Tokuji Miyashita

研究成果: Conference contribution

抄録

The organosilicon nanoclusters (OSI) and organogermanium nanocluster (OGE) which have a few nanometer sized silicon or germanium cluster and organic groups bonded to the nanocluster surfaces show solubility in common organic solvents and good film processability by solution coating method. Using the coating films as precursors, inorganic silicon and germanium films were prepared by heat treatment in vacuo and laser annealing. The structural changes of the Si and Ge skeletons of the OSI and OGE by heat treatment and laser annealing were investigated by Raman spectroscopy. The laser-annealed films showed Raman bands assigned to the polycrystalline structure. The micropatterning of polycrystalline Ge by laser direct writing method was demonstrated. The organosoluble OGE is expected to be applicable as a germanium ink which gives polycrystalline Ge film.

本文言語English
ホスト出版物のタイトルLow-Cost Solution-Based Deposition of Inorganic Films for Electronic/Photonic Devices
ページ110-115
ページ数6
出版ステータスPublished - 2008 12 1
イベント2008 MRS Fall Meeting - Boston, MA, United States
継続期間: 2008 12 22008 12 5

出版物シリーズ

名前Materials Research Society Symposium Proceedings
1113
ISSN(印刷版)0272-9172

Other

Other2008 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period08/12/208/12/5

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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