Optical exposure systems for three-dimensional fabrication of microprobe

Masayoshi Esashi, Kazuyuki Minami, Shuichi Shoji

研究成果: Conference contribution

13 被引用数 (Scopus)

抄録

New optical exposure systems for patterning on nonplanar surfaces were developed. One of them is the photoresist exposure system; the other is the Parylene laser ablation system with KrF excimer laser. Microprobe multielectrodes for recording neuron impulses were fabricated with the photoresist exposure system. However, this method has the disadvantage that it is difficult to coat a nonplanar surface with photoresist uniformly. It is demonstrated that Parylene can be coated uniformly on a nonplanar surface and be patterned by a Parylene laser ablation system. A Cr line with a 10μm width on a glass plate was patterned by Parylene laser ablation and the subsequent lift-off technique. This process is useful for patterning thin film on nonplanar surfaces.

本文言語English
ホスト出版物のタイトルProceedings. IEEE Micro Electro Mechanical Systems
出版社Publ by IEEE
ページ39-44
ページ数6
ISBN(印刷版)0879426411
出版ステータスPublished - 1991 1 1
イベントProceedings of the 1991 IEEE Micro Electro Mechanical Systems - MEMS '91 - Nara, Jpn
継続期間: 1991 1 301991 2 2

出版物シリーズ

名前Proceedings. IEEE Micro Electro Mechanical Systems

Other

OtherProceedings of the 1991 IEEE Micro Electro Mechanical Systems - MEMS '91
CityNara, Jpn
Period91/1/3091/2/2

ASJC Scopus subject areas

  • 制御およびシステム工学
  • 機械工学
  • 電子工学および電気工学

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