Optical characterization of SiO2-TiO2 thin films with graded refractive index profiles

Xinrong Wang, Hiroshi Masumoto, Yoshihiro Someno, Toshio Hirai

研究成果: Article査読

11 被引用数 (Scopus)

抄録

Development of high-quality optical filters has received considerable attention because it's important device in the wavelength division multiplexing technique to realize optical communication with high speed and great capacity. In this work, the graded refractive index profiles are induced in the structure of designed multilayer filters by means of the concept of the functionally graded materials (FGM). Optical characterization of designed and fabricated novel filters with graded refractive index profiles in the SiO2-TiO2 system was investigated. Designed reflection filters have the symmetrical structure with graded refractive index profiles combining with the layers modifying index difference and exhibit higher optical performance than unmodified rugate filter. Designed transmission filters exhibit almost 100% transmittance at the designated wavelength band which can be changed in the range from 1 to 50 nm and a wide reflection region with almost 100% reflectance. A designed 31-layer SiO2-TiO2 film with graded refractive index profiles was fabricated by helicon plasma sputtering and which has superior process controls and consequently better reproducibility. The measured transmittance spectrum exhibited a reflectance of 99.8% at a central wavelength of 730 nm and high transmittance over the wavelength region outside of the reflected band, which corresponded well with calculated one.

本文言語English
ページ(範囲)1069-1074
ページ数6
ジャーナルNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
62
11
DOI
出版ステータスPublished - 1998

ASJC Scopus subject areas

  • 凝縮系物理学
  • 材料力学
  • 金属および合金
  • 材料化学

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