Optical bandgap energy of Si nanoparticle composite films deposited by a multi-hollow discharge plasma chemical vapor deposition method

Susumu Toko, Yoshinori Kanemitsu, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Semiconductor nanoparticles have significant potential for optoelectronic applications such as solar cells and light-emitting diodes. We are developing semiconductor nanoparticle composite films with a wide bandgap to be used as the window layer of solar cells because the bandgap energy increases with a decrease in the size of particles in the nanometer size range due to the quantum size effect. A multi-hollow discharge plasma chemical vapor deposition (CVD) method was used to fabricate Si nanoparticle composite films and control the volume fraction of nanoparticles in the films. The bandgap energy was increased from 2 eV for a crystalline volume fraction Xc of 0.2 to 2.5 eV for Xc = 0.6 and then decreased to 1.1 eV for Xc = 1. The photo and dark conductivity of films indicate high stability against light soaking. Si nanoparticle composite films with bandgap energies above 2.2 eV are thus promising candidate materials for the window layer of thin-film solar cells.

本文言語English
ページ(範囲)10753-10757
ページ数5
ジャーナルJournal of Nanoscience and Nanotechnology
16
10
DOI
出版ステータスPublished - 2016 10
外部発表はい

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

フィンガープリント 「Optical bandgap energy of Si nanoparticle composite films deposited by a multi-hollow discharge plasma chemical vapor deposition method」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル