The one-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure was described. The patterned films were fabricated on poly(dimethyl siloxane)[PDMS], an elastomer substrates with bas-relief patterns. The amphiphilic copolymer used for the fabrication of patterned films films was synthesized. The PDMS was cured on the master pattern at 60°C for 4h.
|ジャーナル||Journal of Materials Science|
|出版ステータス||Published - 2004 3 15|
ASJC Scopus subject areas