One-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure

T. Ohzono, T. Nishikawa, M. Shimomura

    研究成果: Article査読

    23 被引用数 (Scopus)

    抄録

    The one-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure was described. The patterned films were fabricated on poly(dimethyl siloxane)[PDMS], an elastomer substrates with bas-relief patterns. The amphiphilic copolymer used for the fabrication of patterned films films was synthesized. The PDMS was cured on the master pattern at 60°C for 4h.

    本文言語English
    ページ(範囲)2243-2247
    ページ数5
    ジャーナルJournal of Materials Science
    39
    6
    DOI
    出版ステータスPublished - 2004 3 15

    ASJC Scopus subject areas

    • 材料科学(全般)
    • 材料力学
    • 機械工学

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