On-wafer monitoring for conductivity of sidewall in SiO2 contact holes

T. Shinmura, S. Soda, M. Koyanagi, K. Hane, S. Samukawa

研究成果: Conference contribution

抄録

This paper reports on on-wafer monitoring of the conductivity of sidewall-deposited polymer in high-aspect contact holes for the first time. We have found that a carbon-rich polymer causes higher conductivity of sidewall surfaces.

本文言語English
ホスト出版物のタイトル2002 7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002
編集者Calvin T. Gabriel, Terence Hook, Koji Eriguchi
出版社Institute of Electrical and Electronics Engineers Inc.
ページ102-105
ページ数4
ISBN(電子版)0965157776
DOI
出版ステータスPublished - 2002
イベント7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002 - Maui, United States
継続期間: 2002 6 52002 6 7

出版物シリーズ

名前International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings
2002-January

Other

Other7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002
CountryUnited States
CityMaui
Period02/6/502/6/7

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Condensed Matter Physics

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