Observation of reflected X-rays from end face of organic thin film

Kouichi Hayashi, Tokujiro Yamamoto, Takahiro Nakamura, Kensuke Kitani, Kosuke Suzuki, Masahisa Ito, Hiromichi Adachi

研究成果: Article査読

抄録

During the irradiation of white X-rays of synchrotron radiation on copper phthalocyanine thin film on a Si wafer (CuPc/Si) under the grazing incidence condition, X-rays from the end face of the CuPc layer were observed by solid state detector. These were understood to be refractions through the CuPc layer and reflections from the CuPc/Si, because their energy variation as a function of the X-ray exit angle followed Snell's law. We also discussed the similarities and differences between the observed phenomenon and X-ray waveguide phenomenon.

本文言語English
論文番号012029
ジャーナルJournal of Physics: Conference Series
83
1
DOI
出版ステータスPublished - 2007 6月 1
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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