Novel denture-cleaning system based on hydroxyl radical disinfection

Taro Kanno, Keisuke Nakamura, Hiroyo Ikai, Eisei Hayashi, Midori Shirato, Takayuki Mokudai, Atsuo Iwasawa, Yoshimi Niwano, Masahiro Kohno, Keiichi Sasaki

研究成果: Article査読

11 被引用数 (Scopus)

抄録

The purpose of this study was to evaluate a new denture-cleaning device using hydroxyl radicals generated from photolysis of hydrogen peroxide (H2O2). Electron spin resonance analysis demonstrated that the yield of hydroxyl radicals increased with the concentration of H2O2 and light irradiation time. Staphylococcus aureus, Pseudomonas aeruginosa, and methicillin-resistant S aureus were killed within 10 minutes with a > 5-log reduction when treated with photolysis of 500 mM H2O2; Candida albicans was killed within 30 minutes with a > 4-log reduction with photolysis of 1,000 mM H2O2. The clinical test demonstrated that the device could effectively reduce microorganisms in denture plaque by approximately 7-log order within 20 minutes.

本文言語English
ページ(範囲)376-380
ページ数5
ジャーナルInternational Journal of Prosthodontics
25
4
出版ステータスPublished - 2012 1 1

ASJC Scopus subject areas

  • 口腔外科

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