Non-stoichiometry of titanium nitride plates prepared by chemical vapour deposition

Chorn Cherng Jiang, Takashi Goto, Toshio Hirai

研究成果: Article査読

25 被引用数 (Scopus)

抄録

Wide-ranging non-stoichiometric titanium nitride (TiNx) plates (x = 0.74-1.0) were prepared by chemical vapour deposition from a TiCl4-NH3-H2 system. The lattice parameter increased from 0.4228 to 0.4240 nm with increasing x. The density changed in the range between 5.1 and 5.4 × 103 kg m-3, which is in agreement with theoretical values calculated from the lattice parameters and the compositions. The deposition domains of non-stoichiometric TiNx were calculated thermodynamically as a function of input composition. The deposition mechanism of the non-stoichiometric TiNx plates was discussed by comparing the calculations with experimental results.

本文言語English
ページ(範囲)197-200
ページ数4
ジャーナルJournal of Alloys and Compounds
190
2
DOI
出版ステータスPublished - 1993 1 11

ASJC Scopus subject areas

  • 材料力学
  • 機械工学
  • 金属および合金
  • 材料化学

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