Non-epitaxial and graphoepitaxial growth of tin thin films on an UHV-cleaved sodium chloride substrate

T. Osaka, Y. Kasukabe, H. Nakamura

研究成果: Article査読

6 被引用数 (Scopus)

抄録

Thin films of tin were prepared by vacuum deposition on an UHV-cleaved sodium chloride substrate at room temperature in order to study the growth features. The small particles of tin, which were examined by high resolution TEM and electron diffraction, grew graphoepitaxially on steps, whereas those on flat areas were located and oriented almost randomly. The results, therefore, indicate that several works concerning teh epitaxial growth of tin that has been reported so far have been performed on surfaces with a high density of steps parallel to the 〈100〉 direction of the substrate.

本文言語English
ページ(範囲)149-154
ページ数6
ジャーナルJournal of Crystal Growth
69
1
DOI
出版ステータスPublished - 1984 11 1
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 無機化学
  • 材料化学

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