Noise analysis and design optimization due to pattern processing in perpendicular patterned media

Kenji Miura, Yusuke Murakami, Hajime Aoi, Hiroaki Muraoka, Yoshihisa Nakamura

研究成果: Article査読

3 被引用数 (Scopus)

抄録

In patterned media, shape characteristics of dots due to processing fluctuation and resolution will become the main source of the noise. The noise due to the roughness of edge line and roundness by the lithographical resolution was analyzed in this paper. Firstly, edge line roughness was re-created by the method in the semiconductor field, and dot physical pattern was generated. We added the physical pattern roundness due to lithographical resolution varied with the ratio of decreased area by over etching. The result indicated those noise sources caused fatal errors. The processing guidance of the dot was formulated.

本文言語English
ページ(範囲)2904-2907
ページ数4
ジャーナルJournal of Magnetism and Magnetic Materials
320
22
DOI
出版ステータスPublished - 2008 11

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

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