New x-ray nanofocusing devices based on total-reflection zone plates

H. Takano, T. Tsujia, Y. Kagoshimaa

研究成果: Conference contribution

3 被引用数 (Scopus)

抄録

X-ray nanofocusing devices are capable of focusing X-rays down to sizes of about 10 nm. We have developed a new nanofocusing device, known as total-reflection zone plates (TRZPs), for focusing high-brilliance synchrotron radiation in the hard x-ray region. This device consists of a reflective zone pattern on a flat substrate. It has the potential to focus hard x-rays down to sub-10-nm dimensions. Furthermore, it is considerably easier to fabricate than other hard x-ray nanofocusing devices since it is used with a very small grazing incidence angle. We have focused 10-keV x-rays to sub-15 nm dimensions using a TRZP that was fabricated by conventional electron-beam lithography. In addition, we present designs for more efficient devices that have a target focus size of 5 nm. We propose and discuss a new approach for achieving point focusing with nanometer dimensions.

本文言語English
ホスト出版物のタイトルAdvances in X-Ray/EUV Optics and Components VI
DOI
出版ステータスPublished - 2011
外部発表はい
イベントAdvances in X-Ray/EUV Optics and Components VI - San Diego, CA, United States
継続期間: 2011 8 222011 8 24

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
8139
ISSN(印刷版)0277-786X

Other

OtherAdvances in X-Ray/EUV Optics and Components VI
国/地域United States
CitySan Diego, CA
Period11/8/2211/8/24

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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