Nanoscale patterning of Zr-Al-Cu-Ni metallic glass thin films deposited by magnetron sputtering

Parmanand Sharma, Wei Zhang, Kenji Amiya, Hisamichi Kimura, Akihisa Inoue

研究成果: Article査読

61 被引用数 (Scopus)

抄録

Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region (ΔT X = 95 K), very smooth surface (R a = 0.65 nm), and an extremely high value of Vicker's hardness (H v = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width ∼ 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.

本文言語English
ページ(範囲)416-420
ページ数5
ジャーナルJournal of Nanoscience and Nanotechnology
5
3
DOI
出版ステータスPublished - 2005 12月 1
外部発表はい

ASJC Scopus subject areas

  • バイオエンジニアリング
  • 化学 (全般)
  • 生体医工学
  • 材料科学(全般)
  • 凝縮系物理学

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