Nanoscale liquid phase epitaxy between Si and Au nanoparticles

Yutaka Wakayama, Haruko Fujinuma, Shun Ichiro Tanaka

研究成果: Article査読

7 被引用数 (Scopus)

抄録

A self-assembly technique was used for fabrication of a Si/metal interface in nanometer scale. Fine particles of gold of nanometer-order diameter were generated by a gas-phase condensation method and deposited on a Si substrate. Through a heat treatment and a cooling process, a nanoscopic Si-Au composite structure was formed on the surface of the Si substrate. Then, surface diffusing Si atoms played an important role for fabrication of the Si-Au structure which were epitaxially grown projecting onto the substrate. Furthermore, the Si/Au interface was atomically flat with no mixed-layer formation, and the Au nanoparticles also had the same crystal orientation as that of the Si dots in spite of a large lattice constant mismatch between them. This structure was considered to be fabricated as a result of minimization of the total surface and interface energy of the Si/Au system.

本文言語English
ページ(範囲)1492-1496
ページ数5
ジャーナルJournal of Materials Research
13
6
DOI
出版ステータスPublished - 1998 6月
外部発表はい

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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