抄録
Nanofabrication on Si oxide with a low-energy electron-beam-stimulated reaction has been demonstrated using scanning tunneling microscopy (STM) and the mechanism of the low-energy electron-induced etching is investigated further. Direct fabrication of a thin Ag film with this low-energy e-beam/STM method was also tested, which shows an additional capability of the nanofabrication technique. Nanometer-scale patterning of rings on a thin Si-oxide layer using this method shows that further progress nanolithography can be expected with the fabricated Si oxide as a mask.
本文言語 | English |
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ページ(範囲) | 1621-1623 |
ページ数 | 3 |
ジャーナル | Applied Physics Letters |
巻 | 74 |
号 | 11 |
DOI | |
出版ステータス | Published - 1999 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(その他)