Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties

N. I. Fainer, M. L. Kosinova, Yu M. Rumyantsev, E. A. Maximovskii, B. M. Ayupov, B. A. Kolesov, F. A. Kuznetsov, V. G. Kesler, Masami Terauchi, K. Shibata, F. Satoh, Z. X. Cao

研究成果: Paper査読

6 被引用数 (Scopus)

抄録

Nanocrystalline hard silicon carbonitride films were synthesized by RPECVD using the gas mixture of hexamethyldisilazane with ammonia and helium within temperature range of 723-1073 K. IR and Raman spectroscopy, AES, XPS, ellipsometry, XRD using the synchrotron radiation, SEM, HREM, SAED, AFM, measurements of hardness by nanoindenter and spectrophotometry measurements were applied to study their physicochemical properties. The SiCxN y films exhibit high optical transmittance in the spectra range of 1200-2200 nm. Microhardness of these films increases from 18 to 28 GPa, while Young's modulus changes from 135.5 to 185.5 GPa with Si-C bonds content.

本文言語English
ページ1074-1081
ページ数8
出版ステータスPublished - 2005 12 1
イベント15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany
継続期間: 2005 9 52005 9 9

Other

Other15th European Conference on Chemical Vapor Deposition, EUROCVD-15
CountryGermany
CityBochum
Period05/9/505/9/9

ASJC Scopus subject areas

  • Engineering(all)

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