Multilayer mirrors for use as a wavelength-selective filter around 100 eV

M. Yamamoto, M. Yanagihara, A. Arai, J. Cao, S. Nakayama, T. Mizuide, T. Namioka

研究成果: Article査読

4 被引用数 (Scopus)

抄録

Multilayer mirrors have been designed, fabricated and tested for use as a wavelength-selective filter of ∼100 eV for photo-CVD experiments at the beamline 12C of Photon Factory, KEK. Mo/Si and Rh/Si multilayers were selected in accordance with new simple optical criteria and fabricated on super-polished CVD-SiC substrates by means of ion-beam sputtering. Both mirrors showed a reflectance of over 40% at around the designed angle of incidence of 45°.

本文言語English
ページ(範囲)2010-2013
ページ数4
ジャーナルReview of Scientific Instruments
60
7
DOI
出版ステータスPublished - 1989

ASJC Scopus subject areas

  • 器械工学

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