Monolithically integrated low-loss three-dimensional spot-size converter and silicon photonic waveguides constructed by nanotuned Bosch process and oxidation

Ling Han Li, Akio Higo, Masakazu Sugiyama, Yoshiaki Nakano

    研究成果: Article査読

    3 被引用数 (Scopus)

    抄録

    This paper presents a three-dimensional (3D) tapered spot-size converter connecting to silicon wire waveguide and silicon rib waveguide. The silicon 3D structure was essentially formed by a single-step deep anisotropic dry etching of arrayed submicron-scale line patterns with different pitches, resulting in a tailored depth profile which is controlled by the line pattern through loading effect. Subsequent thermal oxidation and removal of the oxidized portion with wet etching led to a bare 3D silicon structure with smooth surface. The optical mode from a 4.6 m 3.1 m silicon rib waveguide was successfully coupled to a 280 nm 500 nm nanowire waveguide by a silicon 3D tapered spot-size converter, with average coupling loss of 1.52 dB.

    本文言語English
    論文番号023002
    ジャーナルJournal of Micro/Nanolithography, MEMS, and MOEMS
    10
    2
    DOI
    出版ステータスPublished - 2011

    ASJC Scopus subject areas

    • 電子材料、光学材料、および磁性材料
    • 原子分子物理学および光学
    • 凝縮系物理学
    • 機械工学
    • 電子工学および電気工学

    フィンガープリント

    「Monolithically integrated low-loss three-dimensional spot-size converter and silicon photonic waveguides constructed by nanotuned Bosch process and oxidation」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル