Molecular beam epitaxy of Co xFe 4-xN (0.4<x<2.9) thin films on SrTiO 3(001) substrates

Tatsunori Sanai, Keita Ito, Kaoru Toko, Takashi Suemasu

研究成果: Article査読

11 被引用数 (Scopus)

抄録

We attempted to grow Co xFe 4-xN epitaxial thin films on SrTiO 3(001) substrates by molecular beam epitaxy supplying solid Co and Fe and a radio frequency N 2 plasma, simultaneously. The composition ratio of Co/Fe in Co xFe 4-xN was controlled by changing the weight ratio of Co to Fe flakes in the crucible of the Knudsen cell used. We confirmed epitaxial growth of Co xFe 4-xN (0.4<x<2.9) thin films by reflection high-energy electron diffraction and θ-2θ X-ray diffraction patterns. The in-plane lattice parameter of the Co xFe 4-xN films was almost the same as the out-of-plane lattice parameter, and they decreased with increasing Co composition, following Vegard's law.

本文言語English
ページ(範囲)53-57
ページ数5
ジャーナルJournal of Crystal Growth
357
1
DOI
出版ステータスPublished - 2012 10 15
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 無機化学
  • 材料化学

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「Molecular beam epitaxy of Co <sub>x</sub>Fe <sub>4-x</sub>N (0.4<x<2.9) thin films on SrTiO <sub>3</sub>(001) substrates」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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